The chemistry and application of Non-Chemically Amplified (Non-CA) chain-scission resists

Whittaker, Andrew K. (2016). The chemistry and application of Non-Chemically Amplified (Non-CA) chain-scission resists. In Alex Robinson and Richard Lawson (Ed.), Materials and processes for next generation lithography (pp. 193-210) Online: Elsevier. doi:10.1016/B978-0-08-100354-1.00006-5


Author Whittaker, Andrew K.
Title of chapter The chemistry and application of Non-Chemically Amplified (Non-CA) chain-scission resists
Title of book Materials and processes for next generation lithography
Language of Book Title eng
Place of Publication Online
Publisher Elsevier
Publication Year 2016
Sub-type Research book chapter (original research)
DOI 10.1016/B978-0-08-100354-1.00006-5
Open Access Status Not yet assessed
Year available 2016
Series Frontiers of Nanoscience
ISBN 9780081003589
9780081003541
ISSN 1876-2778
Editor Alex Robinson
Richard Lawson
Volume number 11
Chapter number 6
Start page 193
End page 210
Total pages 18
Total chapters 17
Language eng
Keyword Self-Immolative Polymers
Electron-Spin-Resonance
Synchrotron-Radiation Lithography
Methyl Alpha-Chloroacrylate
Poly(Methyl Methacrylate)
Beam Resist
Structural-Changes
Poly(Olefin Sulfone)S
Gamma-Radiolysis
Negative Resists
Q-Index Code B1
Q-Index Status Provisional Code
Institutional Status UQ
Additional Notes https://www.elsevier.com/books/materials-and-processes-for-next-generation-lithography/robinson/978-0-08-100354-1

 
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Created: Wed, 08 Mar 2017, 11:03:55 EST by Chris Ende on behalf of Aust Institute for Bioengineering & Nanotechnology