An ultrahigh vacuum system for the fabrication and characterization of ultrathin metal-semiconductor films and sensors

Bergh, HS, Gergen, B, Nienhaus, H, Majumdar, A, Weinberg, WH and McFarland, EW (1999) An ultrahigh vacuum system for the fabrication and characterization of ultrathin metal-semiconductor films and sensors. Review of Scientific Instruments, 70 4: 2087-2094. doi:10.1063/1.1149718


Author Bergh, HS
Gergen, B
Nienhaus, H
Majumdar, A
Weinberg, WH
McFarland, EW
Title An ultrahigh vacuum system for the fabrication and characterization of ultrathin metal-semiconductor films and sensors
Journal name Review of Scientific Instruments   Check publisher's open access policy
ISSN 0034-6748
Publication date 1999-04-01
Sub-type Article (original research)
DOI 10.1063/1.1149718
Open Access Status Not yet assessed
Volume 70
Issue 4
Start page 2087
End page 2094
Total pages 8
Language eng
Keyword Epitaxial Fe Films
Magnetic-Properties
Schottky Barriers
Transistor
Thickness
Temperature
Evolution
Surfaces
Q-Index Code C1
Q-Index Status Provisional Code
Institutional Status Unknown

Document type: Journal Article
Sub-type: Article (original research)
Collection: ResearcherID Downloads - Archived
 
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Citation counts: TR Web of Science Citation Count  Cited 15 times in Thomson Reuters Web of Science Article | Citations
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Created: Mon, 23 Jun 2014, 22:33:01 EST by System User