Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures

Keen, Imelda, Cheng, Han-Hao, Yu, Anguang, Jack, Kevin S., Younkin, Todd R., Leeson, Michael J., Whittaker, Andrew K. and Blakey, Idriss (2014) Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures. Macromolecules, 47 1: 276-283. doi:10.1021/ma4019735

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Author Keen, Imelda
Cheng, Han-Hao
Yu, Anguang
Jack, Kevin S.
Younkin, Todd R.
Leeson, Michael J.
Whittaker, Andrew K.
Blakey, Idriss
Title Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures
Journal name Macromolecules   Check publisher's open access policy
ISSN 0024-9297
1520-5835
Publication date 2014-01-14
Year available 2013
Sub-type Article (original research)
DOI 10.1021/ma4019735
Open Access Status Not yet assessed
Volume 47
Issue 1
Start page 276
End page 283
Total pages 8
Place of publication Washington, DC, United States
Publisher American Chemical Society
Language eng
Abstract Directed self-assembly of block copolymers (BCPs) is a promising technique for the nanofabrication of structures with dimensions smaller than what can be achieved by current photolithography approaches. In particular, there has been significant interest in the development of BCPs that can achieve ever smaller feature sizes with low levels of defects. Here we investigate the directed self-assembly of a high-chi BCP, polystyrene-block-poly(in-lactide), which is capable of producing structures with dimensions less than 10 nm. In addition, we study the behavior of the BCP under nanoconfinement and the ability of the polymer chains to compress and stretch in response to the geometry of the confining volume. Key findings of this study are that the level of defects in the self-assembled structures are strongly related to the relative interfacial interactions of the BCP as well as the degree of frustration of the polymer chains under nanoconfinement relative to the bulk. These results have particular significance for nanofabrication of ordered structures, which is of relevance for the fabrication of nanowires, metamaterials, and next-generation computer chips.
Formatted abstract
Directed self-assembly of block copolymers (BCPs) is a promising technique for the nanofabrication of structures with dimensions smaller than what can be achieved by current photolithography approaches. In particular, there has been significant interest in the development of BCPs that can achieve ever smaller feature sizes with low levels of defects. Here we investigate the directed self-assembly of a high-χ BCP, polystyrene-block-poly(ᴅʟ-lactide), which is capable of producing structures with dimensions less than 10 nm. In addition, we study the behavior of the BCP under nanoconfinement and the ability of the polymer chains to compress and stretch in response to the geometry of the confining volume. Key findings of this study are that the level of defects in the self-assembled structures are strongly related to the relative interfacial interactions of the BCP as well as the degree of frustration of the polymer chains under nanoconfinement relative to the bulk. These results have particular significance for nanofabrication of ordered structures, which is of relevance for the fabrication of nanowires, metamaterials, and next-generation computer chips.
Keyword Polymer Science
Polymer Science
POLYMER SCIENCE
Q-Index Code C1
Q-Index Status Confirmed Code
Grant ID LP0989607
FT 100100721
Institutional Status UQ
Additional Notes Published online 26 December 2013

 
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Created: Tue, 07 Jan 2014, 21:02:28 EST by Cathy Fouhy on behalf of Aust Institute for Bioengineering & Nanotechnology