Contamination resists in metastable atom lithography

Baker, M, Palmer, AJ and Sang, RT (2002). Contamination resists in metastable atom lithography. In: Commad 2002 Proceedings. Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD), Sydney Australia, (201-204). Dec 11-13, 2002.

Author Baker, M
Palmer, AJ
Sang, RT
Title of paper Contamination resists in metastable atom lithography
Conference name Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD)
Conference location Sydney Australia
Conference dates Dec 11-13, 2002
Proceedings title Commad 2002 Proceedings
Journal name Commad 2002 Proceedings
Publication Year 2002
Sub-type Fully published paper
ISBN 0-7803-7571-8
Start page 201
End page 204
Total pages 4
Language eng
Keyword Self-Assembled Monolayers
Films
Gold
Q-Index Code E1
Q-Index Status Provisional Code
Institutional Status Unknown

Document type: Conference Paper
Collection: ResearcherID Downloads - Archived
 
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Created: Sat, 04 May 2013, 05:21:42 EST by System User