The rational design of polymeric EUV resist materials by QSPR modelling

Jack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin and Whittaker, Andrew (2007). The rational design of polymeric EUV resist materials by QSPR modelling. In: Lin, Q, Proceedings of SPIE. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, (Z5193-Z5193). 26 February, 2007. doi:10.1117/12.716213

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Author Jack, Kevin
Liu, Heping
Blakey, Idriss
Hill, David
Yueh, Wang
Cao, Heidi
Leeson, Michael
Denbeaux, Greg
Waterman, Justin
Whittaker, Andrew
Title of paper The rational design of polymeric EUV resist materials by QSPR modelling
Conference name Advances in Resist Materials and Processing Technology XXIV
Conference location San Jose, CA, USA
Conference dates 26 February, 2007
Proceedings title Proceedings of SPIE   Check publisher's open access policy
Journal name Advances in Resist Materials and Processing Technology XXIV   Check publisher's open access policy
Place of Publication USA
Publisher The International Society for Optical Engineering
Publication Year 2007
Year available 2007
Sub-type Poster
DOI 10.1117/12.716213
Open Access Status File (Publisher version)
ISBN 978-0-8194-6638-9
ISSN 0277-786X
Editor Lin, Q
Volume 6519
Issue 65193Z
Start page Z5193
End page Z5193
Total pages 8
Language eng
Abstract/Summary We present the initial results of the development of a qualitative structure property relationship (QSPR) model to guide in the design and synthesis of high-sensitivity, non-CAR materials for EUV lithography. The model was developed using the fragmentation data of low molecular weight species at 70 eV using a mass spectrometer (MS) with an electron ionization source as the input parameter. The preliminary model has highlighted a number of structural elements which will be important in the future design of resists, however, limitations with the current set of input data for molecules which fragment readily have been identified and these are currently being addressed. Additionally, a correlation between gamma (1 MeV) and EUV (92 eV) radiolysis of selected polymers has been established and it is proposed that the higher energy (1 MeV) irradiation source is a suitable model process for EUV and can, therefore, be used in the future screening of polymeric materials.
Subjects 030307 Theory and Design of Materials
Keyword Materials Science, Multidisciplinary
Materials Science
Q-Index Code EX
Q-Index Status Provisional Code
Institutional Status Unknown
Additional Notes Copyright 2007 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

 
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Created: Mon, 20 Apr 2009, 20:01:17 EST by Ms Lynette Adams on behalf of Centre for Microscopy and Microanalysis