Application of edge-to-edge matching model to understand the in-plane texture of TiSi2 (C49) thin films on (001)(Si) surface

Zhang, M. and Kelly, P. M. (2006) Application of edge-to-edge matching model to understand the in-plane texture of TiSi2 (C49) thin films on (001)(Si) surface. Scripta Materialia, 55 7: 613-616.


Author Zhang, M.
Kelly, P. M.
Title Application of edge-to-edge matching model to understand the in-plane texture of TiSi2 (C49) thin films on (001)(Si) surface
Journal name Scripta Materialia  (ERA 2012 Listed)    (ERA 2010 Rank A*)   Check publisher's open access policy
Publication date 2006
Sub-type Article
DOI 10.1016/j.scriptamat.2006.06.006
Volume number 55
Issue number 7
ISSN 1359-6462
Start page 613
End page 616
Total pages 4
Editor Horst Hahn
Place of publication Oxford
Publisher Pergamon-Elsevier Science Ltd
Collection year 2006
Language eng
Subject C1
291302 Physical Metallurgy
670899 Other non-ferrous metals (e.g. copper, zinc)
Abstract The edge-to-edge matching model, which was originally developed for predicting crystallographic features in diffusional phase transformations in solids, has been used to understand the formation of in-plane textures in TiSi2 (C49) thin films on Si single crystal (001)si surface. The model predicts all the four previously reported orientation relationships between C49 and Si substrate based on the actual atom matching across the interface and the basic crystallographic data only. The model has strong potential to be used to develop new thin film materials. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
Keyword Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
Metallurgy & Metallurgical Engineering
Tisi2
Epitaxial Growth
Edge-to-edge Matching
Orientation Relationship
Epitaxial-growth
Boundaries
Transition
Morphology
Si(001)
Lattice
Q-Index Code C1

 
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Created: Wed, 15 Aug 2007, 08:26:13 EST