Plasmonic 'top-hat' nano-star arrays by electron beam lithography

Zhu, Shaoli, Cheng, Han-Hao, Blakey Idriss, Stokes, Nicholas, Ostrikov, Kostya (Ken) and Cortie, Michael (2015) Plasmonic 'top-hat' nano-star arrays by electron beam lithography. Microelectronic Engineering, 139 13-18. doi:10.1016/j.mee.2015.04.084

Author Zhu, Shaoli
Cheng, Han-Hao
Blakey Idriss
Stokes, Nicholas
Ostrikov, Kostya (Ken)
Cortie, Michael
Title Plasmonic 'top-hat' nano-star arrays by electron beam lithography
Journal name Microelectronic Engineering   Check publisher's open access policy
ISSN 0167-9317
Publication date 2015-05-01
Sub-type Article (original research)
DOI 10.1016/j.mee.2015.04.084
Volume 139
Start page 13
End page 18
Total pages 6
Place of publication Amsterdam, Netherlands
Publisher Elsevier BV
Collection year 2016
Language eng
Abstract Lithography techniques play an important role in the fabrication of nanoscale functional devices. In electron beam lithography (EBL) the optimum dose of electron irradiation is a critical parameter. In this paper, we first identify suitable EBL fabrication parameters by writing patterns with different sizes, periods and electron radiation doses. After finding suitable fabrication parameters, we show how five-pointed gold nanostructures with electric field-enhancing 'top hats' can be fabricated using EBL. Reflectance data of these arrays is measured in order to assess their potential applications in biosensing arrays.
Keyword Electron beam lithography
Exposure dose
Optical properties
Q-Index Code C1
Q-Index Status Confirmed Code
Institutional Status UQ

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