Improved photoelectrochemical performance of Ti-doped α-Fe 2O3 thin films by surface modification with fluoride

Hu, Yong-Sheng, Kleiman-Shwarsctein, Alan, Stucky, Galen D. and McFarland, Eric W. (2009) Improved photoelectrochemical performance of Ti-doped α-Fe 2O3 thin films by surface modification with fluoride. Chemical Communications, 19: 2652-2654. doi:10.1039/b901135h


Author Hu, Yong-Sheng
Kleiman-Shwarsctein, Alan
Stucky, Galen D.
McFarland, Eric W.
Title Improved photoelectrochemical performance of Ti-doped α-Fe 2O3 thin films by surface modification with fluoride
Journal name Chemical Communications   Check publisher's open access policy
ISSN 1359-7345
1364-548X
Publication date 2009
Sub-type Article (original research)
DOI 10.1039/b901135h
Open Access Status
Issue 19
Start page 2652
End page 2654
Total pages 3
Place of publication Cambridge, United Kingdom
Publisher R S C Publications
Language eng
Abstract CoF3 aqueous solution was used to modify the surface of Ti-doped iron oxide thin film photoanodes to negatively shift the flat-band potential and allow photogenerated electrons to directly reduce water to hydrogen without an external bias; the zero bias performance was further improved by the use of glucose (a biomass analog) to bypass the relatively slow oxygen evolution reaction to provide a source of electrons to rapidly consume photogenerated holes.
Q-Index Code C1
Q-Index Status Provisional Code
Institutional Status Non-UQ

Document type: Journal Article
Sub-type: Article (original research)
Collection: School of Chemical Engineering Publications
 
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