Mold pattern fabrication by nanoscratching

Shimizu, Jun, Zhou, Libo, Yamamoto, Takeyuki, Ojima, Hirotaka, Onuki, Teppei and Huang, Han (2013) Mold pattern fabrication by nanoscratching. International Journal of Automation Technology, 7 6: 686-693.

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Name Description MIMEType Size Downloads
Author Shimizu, Jun
Zhou, Libo
Yamamoto, Takeyuki
Ojima, Hirotaka
Onuki, Teppei
Huang, Han
Title Mold pattern fabrication by nanoscratching
Journal name International Journal of Automation Technology
ISSN 1881-7629
1883-8022
Publication date 2013
Sub-type Article (original research)
Volume 7
Issue 6
Start page 686
End page 693
Total pages 8
Place of publication Minato-ku, Tokyo, Japan
Publisher Fuji Technology Press
Collection year 2014
Language eng
Formatted abstract
MEMS technologies for various nano/micro-devices often requires special facilities and complicated,multistage processes. The fabrication cost is thus extremely high. Consequently, alternative solutions have been sought, and NanoImprint Lithography (NIL) is one of the potential solutions. To date, the nano/micromolds for NIL are mainly fabricated using photolithography or focused ion beams. However, such beam methods generally make use of special instruments and require a long time to draw precise patterns. Thus, this study aims to fabricate nanoscale structures on monocrystalline silicon substrates using nanoscratching, which can potentially be used to fabricate nano/micro-molds for NIL. This paper discusses how various nano/micro-scale structures such as lineand-space, single-layer, and multiple-layer structures were fabricated on a silicon substrate using nanoscratching by an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. Subsequent chemical etching was also conducted on the fabricated groove patterns to enlarge the depth of the fabricated groove patterns. The results confirmed that the groove was deepened several times, with only a slight increase in its width. A nanoimprint experiment was also carried out, and the line-and-space patterns were duplicated successfully on a polycarbonate resin film.
Keyword Atomic force microscope
Silicon wafer
Line-and-space pattern
Chemical etching
Nanoimprint lithography
Q-Index Code C1
Q-Index Status Confirmed Code
Institutional Status UQ

Document type: Journal Article
Sub-type: Article (original research)
Collections: School of Mechanical & Mining Engineering Publications
Official 2014 Collection
 
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Created: Tue, 05 Nov 2013, 22:24:44 EST by Professor Han Huang on behalf of School of Mechanical and Mining Engineering