Lithographic pattern formation via metastable state rare gas atomic beams

Baker, M, Palmer, AJ, MacGillivray, WR and Sang, RT (2004) Lithographic pattern formation via metastable state rare gas atomic beams. Nanotechnology, 15 9: 1356-1362. doi:10.1088/0957-4484/15/9/041


Author Baker, M
Palmer, AJ
MacGillivray, WR
Sang, RT
Title Lithographic pattern formation via metastable state rare gas atomic beams
Journal name Nanotechnology   Check publisher's open access policy
ISSN 0957-4484
Publication date 2004-09
Sub-type Article (original research)
DOI 10.1088/0957-4484/15/9/041
Volume 15
Issue 9
Start page 1356
End page 1362
Total pages 7
Language eng
Keyword Self-Assembled Monolayers
Thin-Films
Helium
Nanolithography
Argon
Gold
Nanofabrication
Silicon
Resist
Damage
Q-Index Code C1
Q-Index Status Provisional Code
Institutional Status Unknown

Document type: Journal Article
Sub-type: Article (original research)
Collection: ResearcherID Downloads
 
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Citation counts: TR Web of Science Citation Count  Cited 11 times in Thomson Reuters Web of Science Article | Citations
Scopus Citation Count Cited 8 times in Scopus Article | Citations
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Created: Fri, 03 May 2013, 19:21:05 EST by System User