Atomic force microscopy study of forces between a silica sphere and an oxidized silicon wafer in aqueous solutions of NaCl, KCl, and CsCl at concentrations up to saturation

Wang, Yuhua, Wang, Liguang, Hampton, Marc A. and Nguyen, Anh V. (2013) Atomic force microscopy study of forces between a silica sphere and an oxidized silicon wafer in aqueous solutions of NaCl, KCl, and CsCl at concentrations up to saturation. Journal of Physical Chemistry C, 117 5: 2113-2120. doi:10.1021/jp3092495


Author Wang, Yuhua
Wang, Liguang
Hampton, Marc A.
Nguyen, Anh V.
Title Atomic force microscopy study of forces between a silica sphere and an oxidized silicon wafer in aqueous solutions of NaCl, KCl, and CsCl at concentrations up to saturation
Journal name Journal of Physical Chemistry C   Check publisher's open access policy
ISSN 1932-7447
1932-7455
Publication date 2013-02-07
Sub-type Article (original research)
DOI 10.1021/jp3092495
Volume 117
Issue 5
Start page 2113
End page 2120
Total pages 8
Place of publication Washington, DC, United States
Publisher American Chemical Society
Collection year 2014
Language eng
Formatted abstract
This paper describes the measured forces between a spherical silica particle and a planar oxidized silicon wafer in NaCl, KCl, and CsCl aqueous solutions using an atomic force microscope (AFM). The magnitudes of measured forces are sensitive to electrolyte type and concentration over a broad range of 0.01–4 M under study. Increasing NaCl and KCl concentrations finds the suppression of repulsion at low concentrations, the appearance of attraction at an intermediate concentration, and the suppression of the attraction at high concentrations. In contrast, no attractions were detected for CsCl solutions except at 0.5 M, and increasing the concentration would lead to suppression of repulsion at the low concentration range and enhancement of repulsion at the high concentration range. The deviation between the measured total force and the calculated double-layer repulsion can be represented in the form of a power law incorporating an effective Hamaker constant (Aeff) and an offset separation distance.
Keyword Hydration forces
Colloidal silica
DLVO theory
Surfaces
Q-Index Code C1
Q-Index Status Confirmed Code
Institutional Status UQ

Document type: Journal Article
Sub-type: Article (original research)
Collections: School of Chemical Engineering Publications
Official 2014 Collection
 
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