EUVL compatible, LER solutions using functional block copolymers

Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2012). EUVL compatible, LER solutions using functional block copolymers. In: William M. Tong and Douglas J. Resnick, Proceedings of SPIE: Alternative Lithographic Technologies IV. Conference on Alternative Lithographic Technologies IV, San Jose, CA, United States, (83231O.1-83231O.11). 13-16 February 2012. doi:10.1117/12.916744


Author Cheng, Han-Hao
Keen, Imelda
Yu, Anguang
Chuang, Ya-Mi
Blakey, Idriss
Jack, Kevin S.
Leeson, Michael J.
Younkin, Todd R.
Whittaker, Andrew K.
Title of paper EUVL compatible, LER solutions using functional block copolymers
Conference name Conference on Alternative Lithographic Technologies IV
Conference location San Jose, CA, United States
Conference dates 13-16 February 2012
Proceedings title Proceedings of SPIE: Alternative Lithographic Technologies IV   Check publisher's open access policy
Journal name Proceedings of SPIE - International Society for Optical Engineering   Check publisher's open access policy
Place of Publication Bellingham, WA, United States
Publisher S P I E - International Society for Optical Engineering
Publication Year 2012
Sub-type Fully published paper
DOI 10.1117/12.916744
ISBN 9780819489791
ISSN 0277-786X
1996-756X
Editor William M. Tong
Douglas J. Resnick
Volume 8323
Start page 83231O.1
End page 83231O.11
Total pages 11
Collection year 2013
Language eng
Formatted Abstract/Summary Directed self assembly (DSA) of block copolymers is an emerging technology for achieving sub-lithographic resolution.
We investigate the directed self assembly of two systems, polystyrene-block-poly-DL-lactic acid (PS-b-PDLA) and PSb-
poly(methyl methacrylate). For the PS-b-PDLA system we use an open source EUVL resist and a commerciallyavailable
underlayer to prepare templates for DSA. We investigate the morphology of the phase separated domains and
compare the LER of the resist and the PS-PDLA interface. For the PS-b-PMMA system we again use an open source
resist, but the annealing conditions in this case require crosslinking of the resist prior to deposition of the block
copolymer. For this system we also investigate the morphology of the phase separated domains and compare the LER of
the resist and the PS-PMMA interface.
Keyword EUVL
LER
Directed self assembly
Block copolymers
PS-b-PDLA
Q-Index Code E1
Q-Index Status Confirmed Code
Institutional Status UQ

 
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