Line defects embedded in three-dimensional photonic crystals

Yan, Qingfeng, Zhou, Zuocheng, Zhao, Xiu Song and Chua, Soo Jin (2005) Line defects embedded in three-dimensional photonic crystals. Advanced Materials, 17 15: 1917-1920. doi:10.1002/adma.200500047


Author Yan, Qingfeng
Zhou, Zuocheng
Zhao, Xiu Song
Chua, Soo Jin
Title Line defects embedded in three-dimensional photonic crystals
Journal name Advanced Materials   Check publisher's open access policy
ISSN 0935-9648
1521-4095
Publication date 2005-08
Sub-type Article (original research)
DOI 10.1002/adma.200500047
Volume 17
Issue 15
Start page 1917
End page 1920
Total pages 4
Place of publication Weinheim, Germany
Publisher Wiley - VCH Verlag
Language eng
Abstract Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).
Keyword Defect engineering
Photolithography
Photonic crystals
Colloidal
Q-Index Code C1
Q-Index Status Provisional Code
Institutional Status Non-UQ
Additional Notes Published under Communications

Document type: Journal Article
Sub-type: Article (original research)
Collections: School of Chemical Engineering Publications
ERA 2012 Admin Only
 
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