Mass transfer of metal ion implantation into metal targets at elevated temperatures

Chang, H. W. and Lei, M. K. (2005) Mass transfer of metal ion implantation into metal targets at elevated temperatures. Computational Materials Science, 33 4: 459-466. doi:10.1016/j.commatsci.2004.10.001


Author Chang, H. W.
Lei, M. K.
Title Mass transfer of metal ion implantation into metal targets at elevated temperatures
Journal name Computational Materials Science   Check publisher's open access policy
ISSN 0927-0256
Publication date 2005-06
Year available 2004
Sub-type Article (original research)
DOI 10.1016/j.commatsci.2004.10.001
Volume 33
Issue 4
Start page 459
End page 466
Total pages 8
Place of publication Amsterdam, Netherlands
Publisher Elsevier BV
Language eng
Abstract A mass transfer model for metal ion implantation into a metal target at elevated temperatures has been built up based on transport of ions in matter and radiation enhanced diffusion. It is used to calculate concentration-depth profiles and compositional changes of the implanted species. The ion implantation at elevated temperatures was simulated by a dynamic Monte Carlo (MC) method, which takes into account a local saturation in the crystalline target by using a maximum atomic fraction allowed in the matrix. For the diffusion process, the transport of the implanted species was obtained from the diffusion equations for the implanted species and nonequilibrium vacancies. The radiation enhanced diffusion coefficient was obtained by taking into account linear annealing of the defects. A nonequilibrium vacancy source function and surface sputtering were introduced into the diffusion equations. Concentration-depth profiles of Cr, Fe and Ni ions implanted into Al at a temperature range from 200 to 510 °C were calculated. The calculated results principally were consistent with measured concentration-depth profiles obtained by Rutherford backscattering spectroscopy (RBS). In some cases deviations occur, which are discussed.
Keyword Mass transfer modeling
Ion implantation
Metal
Dynamic Monte Carlo method
Q-Index Code C1
Q-Index Status Provisional Code
Institutional Status Non-UQ
Additional Notes Available online 10 December 2004

Document type: Journal Article
Sub-type: Article (original research)
Collections: School of Mechanical & Mining Engineering Publications
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Created: Thu, 20 Oct 2011, 11:01:41 EST by Jeffrey Chang on behalf of School of Mechanical and Mining Engineering