Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Lawrie, Kirsten, Blakey, Idriss, Blinco, James, Gronheid, Roel, Jack, Kevin, Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists. In: O. Guven, D.J.T. Hill and S. Tagawa, Radiation Modification Of Polymers. 11th Pacific Polymer Conference, Cairns, Australia, (236-241). 6-10 December 2009. doi:10.1016/j.radphyschem.2010.07.038

Author Lawrie, Kirsten
Blakey, Idriss
Blinco, James
Gronheid, Roel
Jack, Kevin
Pollentier, Ivan
Leeson, Michael J.
Younkin, Todd R.
Whittaker, Andrew K.
Title of paper Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists
Conference name 11th Pacific Polymer Conference
Conference location Cairns, Australia
Conference dates 6-10 December 2009
Proceedings title Radiation Modification Of Polymers   Check publisher's open access policy
Journal name Radiation Physics and Chemistry   Check publisher's open access policy
Place of Publication Kidlington, Oxford, U. K.
Publisher Pergamon
Publication Year 2011
Year available 2010
Sub-type Fully published paper
DOI 10.1016/j.radphyschem.2010.07.038
ISSN 0969-806X
Editor O. Guven
D.J.T. Hill
S. Tagawa
Volume 80
Issue 2
Start page 236
End page 241
Total pages 6
Collection year 2011
Language eng
Abstract/Summary Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO2 moieties to a sulfide phase was observed using XPS. Copyright © 2010 Elsevier Ltd All rights reserved.
Subjects C1
030306 Synthesis of Materials
100706 Nanofabrication, Growth and Self Assembly
100710 Nanometrology
Keyword Poly(olefin sulfone)
Q-Index Code C1
Q-Index Status Confirmed Code
Institutional Status UQ
Additional Notes Available online 3 August 2010.

Version Filter Type
Citation counts: TR Web of Science Citation Count  Cited 10 times in Thomson Reuters Web of Science Article | Citations
Scopus Citation Count Cited 10 times in Scopus Article | Citations
Google Scholar Search Google Scholar
Created: Mon, 13 Sep 2010, 11:48:36 EST by Sandrine Ducrot on behalf of Centre for Advanced Imaging