Efficient large scale nano dot array deposition and stacking using focused ion beam system

Cheng, H. H., Alkaisi, M. M., Wu, S. -E. and Liu, C. -P. (2009). Efficient large scale nano dot array deposition and stacking using focused ion beam system. In: Microelectronic Engineering. Proceedings of: MNE ’08 - The 34th International Conference on Micro- and Nano-Engineering (MNE). MNE 2008: 34th International Conference On Micro & Nano Engineering, Athens, Greece, (). 15 -19 September 2008.


Author Cheng, H. H.
Alkaisi, M. M.
Wu, S. -E.
Liu, C. -P.
Title of paper Efficient large scale nano dot array deposition and stacking using focused ion beam system
Conference name MNE 2008: 34th International Conference On Micro & Nano Engineering
Conference location Athens, Greece
Conference dates 15 -19 September 2008
Proceedings title Microelectronic Engineering. Proceedings of: MNE ’08 - The 34th International Conference on Micro- and Nano-Engineering (MNE)   Check publisher's open access policy
Place of Publication Amsterdam, Netherlands
Publisher Elsevier BV
Publication Year 2009
Sub-type Poster
ISSN 0167-9317
1873-5568
Volume 86
Issue 4-6
Language eng
Abstract/Summary Direct deposition of metal dot array structures including pillars suitable for most types of substrates using FEI system is presented. This approach allows the fabrication of large scale dot arrays in a controllable way at which the diameters and spacing can be adjusted by the choice of dose and magnification.
Subjects 0906 Electrical and Electronic Engineering
Q-Index Code EX
Q-Index Status Provisional Code
Institutional Status Unknown
Additional Notes Presented as Poster no. EIB2 - P 02 during "Poster Session IΙ: Electron and Ion Beam Lithography (EIB 1-2)","EIB2: Ion Beam Lithography". This poster was not published in the Proceedings.

 
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Created: Mon, 29 Mar 2010, 13:32:46 EST by Jon Swabey on behalf of Aust Institute for Bioengineering & Nanotechnology