Application of quantitative structure property relationship to the design of high refractive index 193i resist

Liu, Heping, Blakey, Idriss, Conley, Willard E., Graeme George, Hill, David J. T. and Whittaker, Andrew K. (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7 2: 023001-1-023001-11. doi:10.1117/1.2908937


Author Liu, Heping
Blakey, Idriss
Conley, Willard E.
Graeme George
Hill, David J. T.
Whittaker, Andrew K.
Title Application of quantitative structure property relationship to the design of high refractive index 193i resist
Journal name Journal of Micro/Nanolithography, MEMS, and MOEMS   Check publisher's open access policy
ISSN 1932-5150
Publication date 2008-04
Year available 2008
Sub-type Article (original research)
DOI 10.1117/1.2908937
Volume 7
Issue 2
Start page 023001-1
End page 023001-11
Total pages 11
Editor J. L. Burn
Place of publication Bellingham, USA
Publisher Society of Photo-Optical Instrumentation Engineers (SPIE)
Collection year 2009
Language eng
Subject 030306 Synthesis of Materials
861603 Integrated Circuits and Devices
Abstract A robust quantitative structure property relationship (QSPR) model with five parameters has been developed from 126 organic compounds for the prediction of refractive index at 589 nm. The model and the knowledge of the refractive index dispersion were used in the rational design of new materials for 193-nm immersion lithography. The significance of this model is that the structural descriptors can be readily calculated and the factors that significantly affect refractive index can be easily identified and used to guide the selection of candidates. Using this model, rapid screening of large structure databases is possible in order to find candidates. As an example of this approach, the synthesis of the copolymer of a trithiocyclane-methacrylate derivative, identified by the model, with 2-methyl adamantyl methacrylate is described. The measured refractive index of the copolymer at 589 nm agrees well with the value predicted by the model. The new polymer showed a 9.4% increase in refractive index at 193 nm compared with the standard ArF resist.
Keyword Quantitative structure property relationship (QSPR)
Rational design
Refractive index polymer
193-nm immersion lithography
Sulfur
Q-Index Code C1
Q-Index Status Confirmed Code

 
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Created: Thu, 26 Mar 2009, 14:55:45 EST by Lesley-Jayne Jerrard on behalf of Centre For Magnetic Resonance