Novel high-index resists for 193nm immersion lithography and beyond

Blakey, Idriss, Chen, Lan, Dargaville, Bronwin, Lui, Heping, Whittaker, Andrew, Conley, Will, Piscani, Emil, Rich, George, Williams, Alvina and Zimmerman, Paul (2007). Novel high-index resists for 193nm immersion lithography and beyond. In: Qinghuang Lin, Proceedings of SPIE 2007. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, (651909). 26 February, 2007. doi:10.1117/12.715108

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Author Blakey, Idriss
Chen, Lan
Dargaville, Bronwin
Lui, Heping
Whittaker, Andrew
Conley, Will
Piscani, Emil
Rich, George
Williams, Alvina
Zimmerman, Paul
Title of paper Novel high-index resists for 193nm immersion lithography and beyond
Conference name Advances in Resist Materials and Processing Technology XXIV
Conference location San Jose, CA, USA
Conference dates 26 February, 2007
Convener The International Society for Optical Engineering
Proceedings title Proceedings of SPIE 2007   Check publisher's open access policy
Place of Publication Bellingham WA, USA
Publisher SPIE
Publication Year 2007
Sub-type Fully published paper
DOI 10.1117/12.715108
Open Access Status File (Publisher version)
ISBN 978-0-8194-6638-9
ISSN 0277-786X
Editor Qinghuang Lin
Volume 6159
Start page 651909
Total pages 9
Language eng
Abstract/Summary A preliminary Quantitative Structure Property Relationship (QSPR) model for predicting the refractive index of small molecules and polymers at 193 nm is presented. Although at this stage the model is only semiquantitative we have found it useful for screening databases of commercially-available compounds for high refractive index targets to include in our program of synthesis of high refractive index resist polymers. These resists are targeted for use in 2nd and 3rd generation 193 nm immersion lithography. Using this methodology a range of targets were identified and synthesized via free radical polymerization. Novel resist polymers were also synthesized via Michael addition polymerization. Preliminary dose to clear experiments identified a number of promising candidates for incorporation into high refractive index resist materials. Furthermore, we have demonstrated imaging of a high index resist using water-based 193 nm immersion lithography.
Subjects 030303 Optical Properties of Materials
030306 Synthesis of Materials
030301 Chemical Characterisation of Materials
Keyword Photonics -- Congresses
Electrooptics -- Congresses
Q-Index Code E1
Additional Notes Copyright 2007 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

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