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Chuang, Yami, Whittaker, Andrew, Keen, Imelda and Jack, Kevin (2008). Development of polymeric-base ultrasound contrast agent. In: 30APS: Abstract book. 30APS 2008: Australian Polymer Symposium, Melbourne, VIC, Australia, (). 30 November-4 December 2008. 53  
Chuang, Ya-Mi (2013). Directed self assembly of rationally designed block copolymers: Towards an advanced lithography process for reducing line edge roughness PhD Thesis, Australian Institute for Bioengineering and Nanotechnology, The University of Queensland. 172 119
Cheng, Han-Hao, Yu, Anguang, Keen, Imelda, Chuang, Yami, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R., Blakey, Idriss and Whittaker, Andrew K. (2012) Electron-beam induced freezing of an aromatic based EUV resist: a robust template for directed self assembly of block copolymers. IEEE Transactions on Nanotechnology, 11 6: 1140-1147. doi:10.1109/TNANO.2012.2216544 75   3 Cited 6 times in Scopus6 0
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Electron-beam-induced freezing of a positive tone EUV resist for use in directed self-assembly applications. In: Proceedings of SPIE - International Society for Optical Engineering. Alternative Lithographic Technologies III, San Jose, CA, United States, (79701V.1-79701V.9). 1-3 March 2011. doi:10.1117/12.881491 89 3 2 Cited 3 times in Scopus3 1
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2012). EUVL compatible, LER solutions using functional block copolymers. In: William M. Tong and Douglas J. Resnick, Proceedings of SPIE: Alternative Lithographic Technologies IV. Conference on Alternative Lithographic Technologies IV, San Jose, CA, United States, (83231O.1-83231O.11). 13-16 February 2012. doi:10.1117/12.916744 81   0 Cited 6 times in Scopus6 0
Chuang, Ya-Mi, Cheng, Han-Hao, Jack, Kevin, Whittaker, Andrew and Blakey, Idriss (2013). Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers. In: William M. Tong and Douglas J. Resnick, Alternative lithographic technologies V. Conference on Alternative Lithographic Technologies V, San Jose, CA United States, (868009.1-868009.9). 25-28 February 2013. doi:10.1117/12.2012488 38 2 1 Cited 3 times in Scopus3 0
Rasoul, Firas, Wang, David, Chuang, Yami, Peng, Hui, Symons, Anne, Varanasi, Srinivas and Whittaker, Andrew K. (2010). Hydrogels systems based on PLA-PEG-PLA tri-block copolymers and multi-functional arms macromers “effect of morphology on swelling and degradation properties”. In: 11th Pacific Polymer Conference 2009 program. 11th Pacific Polymer Conference 2009, Cairns, Qld., Australia, (). 6-11 December 2009. 94  
Blakey, Idriss, Merican, Zul, Rintoul, Llewellyn, Chuang, Ya-Mi, Jack, Kevin S. and Micallef, Aaron S. (2012) Interactions of iodoperfluorobenzene compounds with gold nanoparticles. Physical Chemistry Chemical Physics, 14 10: 3604-3611. doi:10.1039/c2cp23809h 48   9 Cited 8 times in Scopus8 0
Blakey, Idriss, Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Ya-mi, Piscani, Emil, Zimmerman, Paul A. and Whittaker, Andrew K. (2009). Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity. In: Ron C. Driggers and Karolyn Labes, Proceedings of SPIE. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, USA, (72733X.1-72733X.9). 23 February 2009. doi:10.1117/12.814076 113   7 Cited 11 times in Scopus11 0
Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Yami, Piscani, Emil, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2011) Polysulfone based Non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivity. Radiation Physics And Chemistry, 80 2: 242-247. doi:10.1016/j.radphyschem.2010.07.040 119   7 Cited 7 times in Scopus7 0
Chuang, Ya-Mi, Jack, Kevin S., Cheng, Han-Hao, Whittaker, Andrew K. and Blakey, Idriss (2012) Using directed self assembly of block copolymer nanostructures to modulate nanoscale surface roughness: towards a novel lithographic process. Advanced Functional Materials, 23 2: 173-183. doi:10.1002/adfm.201200564 64   10 Cited 11 times in Scopus11 0