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Chen, Lan, Goh, Yong Keng, Cheng, Han Hao, Smith, Bruce W., Xie, Peng, Montgomery, Warren, Whittaker, Andrew K. and Blakey, Idriss (2012) Aqueous developable dual switching photoresists for nanolithography. Journal of Polymer Science Part A: Polymer Chemistry, 50 20: 4255-4265. doi:10.1002/pola.26232 69   6 Cited 6 times in Scopus6 0
Goh, Y. K., Whittaker, M. R. and Monteiro, M. J. (2005) Controlled Radical Polymerization of Styrene and Methyl Acrylate in the Presence of Reversible Addition-Fragmentation Chain Transfer Agents, Phenylethyl Phenyl Dithioacetate and Phenyldithioacetic Acid. Journal of Polymer Science Part A-polymer Chemistry, 43 21: 5232-5245. doi:10.1002/pola.21020 208   17 Cited 19 times in Scopus19 0
Plummer, R., Goh, Y. K., Whittaker, A. K. and Monteiro, M. J. (2005) Effect of Impurities InCumyl Dithiobenzoate on RAFT-mediated Polymerizations. Macromolecules, 38 12: 5352-5355. doi:10.1021/ma050719x 77   52 Cited 57 times in Scopus57 0
Blakey, Idriss, Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Ya-mi, Piscani, Emil, Zimmerman, Paul A. and Whittaker, Andrew K. (2009). Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity. In: Ron C. Driggers and Karolyn Labes, Proceedings of SPIE. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, USA, (72733X.1-72733X.9). 23 February 2009. doi:10.1117/12.814076 109   7 Cited 11 times in Scopus11 0
Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Smith, Bruce, Montgomery, Warren, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2010). Non-chemically amplified resists for 193-nm immersion lithography: Influence of absorbance on performance. In: Robert D. Allen and Mark H. Somervell, Proceedings of SPIE - The International Society for Optical Engineering. Advances in Resist Materials and Processing Technology XXVII, San Jose, California, U.S.A., (). 22-24 February, 2010. doi:10.1117/12.846971 70   1 Cited 4 times in Scopus4 0
Goh, Y. K. and Monteiro, M. J. (2006) Novel approach to tailoring molecular weight distribution and structure with a difunctional RAFT agent. Macromolecules, 39 15: 4966-4974. doi:10.1021/ma060395s 78   18 Cited 15 times in Scopus15 0
Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Chuang, Yami, Piscani, Emil, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2011) Polysulfone based Non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivity. Radiation Physics And Chemistry, 80 2: 242-247. doi:10.1016/j.radphyschem.2010.07.040 114   7 Cited 7 times in Scopus7 0
Goh, Yong Keng, Chen, Lan, Dorgelo, Anneke, Peng, Xie, Lafferty, Neal, Smith, Bruce, Zimmerman, Paul, Montgomery, Warren, Blakey, Idriss and Whittaker, Andrew K. (2011). Sensitive polysulfone based chain scissioning resists for 193 nm lithography. In: Advances in resist materials and processing technology XXVIII. Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States, (79722E.1-79722E.8). 28 February - 2 March 2011. doi:10.1117/12.881700 62   0 Cited 0 times in Scopus0 0
Whittaker, M. R., Goh, Y. K., Gemici, H., Legge, T. M., Perrier, S. and Monteiro, M J (2006) Synthesis of monocyclic and linear polystyrene using the reversible coupling/cleavage of thiol/disulfide groups. Macromolecules, 39 26: 9028-9034. doi:10.1021/ma061070e 128   86 Cited 81 times in Scopus81 0
Yong Keng Goh (2007). Synthesis of Nano-scale Polymers via RAFT Polymerization PhD Thesis, School of Molecular & Microbial Science, The University of Queensland. 581 275
Goh, Y. K., Whittaker, A. K. and Monteiro, M. J. (2007) Versatile synthetic approach to reversible crosslinked polystyrene networks via RAFT polymerization. Journal of Polymer Science Part A-polymer Chemistry, 45 17: 4150-4153. doi:10.1002/pola.22162 67   18 Cited 19 times in Scopus19 0