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Liu, Heping, Blakey, Idriss, Conley, Willard E., Graeme George, Hill, David J. T. and Whittaker, Andrew K. (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7 2: 023001-1-023001-11. doi:10.1117/1.2908937 102   6 0
Zimmerman, Paul A., Byers, Jeff, Piscani, Emil, Rice, Bryan, Ober, Christopher K., Giannelis, Emmanuel P., Rodriguez, Robert, Wang, Dongyan, Whittaker, Andrew, Blakey, Idriss, Chen, Lan, Dargaville, Bronwin and Liu, Heping (2008). Development of an operational high refractive index resist for 193nm immersion lithography. In: Clifford L. Henderson, Proceedings of SPIE 2008: Advances in Resist Materials and Processing Technology XXV. Advances in Resist Materials and Processing Technology XXV, San Jose, CA, USA, (692306-1-692306-10). 25 February 2008. doi:10.1117/12.772871 205   0 Cited 8 times in Scopus8 0
Whittaker, Andrew K., Blakey, Idriss, Blinco, James, Jack, Kevin S., Lawrie, Kirsten, Liu, Heping, Yu, Anguang, Leeson, Michael, Yeuh, Wang and Younkin, Todd (2009). Development of polymers for non-CAR resists for EUV lithography. In: Ron C. Driggers and Karolyn Labes, Proceedings of SPIE - The International Society for Optical Engineering. Advances in Resist Materials and Processing Technology XXVI, San Jose, CA, United States, (727321-1-727321-10). 23-25 February 2009. doi:10.1117/12.820493 83   8 Cited 11 times in Scopus11 0
Liu, Heping, Blakey, Idriss, Chen, Lan, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). From Structure Property Relationship to Molecular Design. In: Proceedings of the 29th Australasian Polymer Symposium. 29th Australasian Polymer Symposium, Hobart, (105-106). 11-15 February 2007. 76  
Cash, Gregory A., Liu, Heping, Birtwhistle, David and George, Graeme Allan (2002). Material analysis techniques for assessing the performance of populations of composite insulators. In: Proceedings of: First Annual Overhead Transmission Line Equipment. Inspection and Maintenance Pnctice Conference. First Annual Overhead Transmission Line Equipment. Inspection and Maintenance Pnctice Conference, California, USA, (1-11). 14-16 May 2002. 48 3
Blakey, I, George, GA, Hill, DJT, Liu, HP, Rasoul, F, Rintoul, L, Zimmerman, P and Whittaker, AK (2007) Mechanism of 157 nm photodegradation of poly[4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole-co-tetrafluorethylene] (Teflon AF). Macromolecules, 40 25: 8954-8961. doi:10.1021/ma071549m 243   12 Cited 14 times in Scopus14 0
Blakey, Idriss, Chen, Lan, Dargaville, Bronwin, Lui, Heping, Whittaker, Andrew, Conley, Will, Piscani, Emil, Rich, George, Williams, Alvina and Zimmerman, Paul (2007). Novel high-index resists for 193nm immersion lithography and beyond. In: Qinghuang Lin, Proceedings of SPIE 2007. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, (651909). 26 February, 2007. doi:10.1117/12.715108 78   6 Cited 14 times in Scopus14 0
Yu, Anguang, Liu, Heping, Blinco, James, Jack, Kevin S., Leeson, Michael, Younkin, Todd R., Whittaker, Andrew K. and Blakey, Idriss (2010) Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography. Macromolecular Rapid Communications, 31 16: 1449-1455. doi:10.1002/marc.201000117 95   14 Cited 16 times in Scopus16 0
Blakey, Idriss, Yu, Anguang, Blinco, James, Jack, Kevin S., Liu, Heping, Leeson, Michael, Yeuh, Wang, Younkin, Todd and Whittaker, Andrew (2010). Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography. In: Robert D. Allen and Mark H. Somervell, Proceedings of SPIE - The International Society for Optical Engineering. Extreme Ultraviolet (EUV) Lithography, San Jose, California, U.S.A., (1-8). 22 February, 2010. doi:10.1117/12.853620 89   4 Cited 7 times in Scopus7 0
Whittaker, Andrew K., Blakey, Idriss, Chen, Lan, Dargaville, Bronwin L., Liu, Heping, Conley, Will and Zimmerman, Paul A. (2007) Rational Design of High-RI Resists for 193nm Immersion Lithography. Journal of Photopolymer Science and Technology, 20 5: 665-671. doi:10.2494/photopolymer.20.665 70   8 Cited 8 times in Scopus8 0
Hunt, Susan, Cash, Greg, Liu, Heping, George, Graeme and Birtwhistle, David (2002) Spectroscopic characterization of low molecular weight fluids from silicone elastomers. Journal of Macromolecular Science: Part A - Pure and Applied Chemistry, A39 9: 1007-1024. doi:10.1081/MA-120013576 80 5 13 Cited 12 times in Scopus12 0
Zimmerman, Paul A., Van Peski, Chris, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothschild, Mordy, Whittaker, Andrew K., Blakey, Idriss, Chen, Lan, Dargaville, Bronwin and Liu, Heping (2007) Status of High-Index Materials for Generation-Three 193nm Immersion Lithography. Journal of Photopolymer Science and Technology, 20 5: 643-650. doi:10.2494/photopolymer.20.643 80   15 Cited 15 times in Scopus15 0
Liu, Heping, Cash, Gregory A., Sovar, Robert D. and George, Graeme A. (2006) Studies of the diffusion of low molecular weight silicone fluids on polluted HV silicone insulators. 1. Use of diffuse reflectance FTIR. IEEE Transactions on Dielectrics and Electrical Insulation, 13 4: 877-884. doi:10.1109/TDEI.2006.1667749 95   9 Cited 14 times in Scopus14 0
Dargaville, Bronwin, Blakey, Idriss, Chen, Lan, Conley, Will, George, Graeme A., Hill, David J.T., Liu, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis and Characterisation of Sulfur-Containing Polymers as Photo-Resist Materials for 193 nm Immersion Lithography. In: Proceedings of the 29th Australasian Polymer Symposium. 29th Australasian Polymer Symposium, Hobart, Tasmania, (371-372). 11-15 February 2007. 135  
Blakey, I, Conley, W, George, GA, Hill, DJT, Liu, HP, Rasoul, F and Whittaker, AK (2006). Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography: A progress report. In: Proceedings of SPIE 2006. Advances in Resist Technology and Processing XXIII, San Jose, CA, USA, (61530H). 20 February, 2006. doi:10.1117/12.659757 93   3 Cited 12 times in Scopus12 0
Chen, Lan, Blakey, Idriss, Conley, Will, Dargaville, Bronwin, George, Graeme A., Hill, David J.T., Lui, Heping, Rasoul, Firas, Rice, Bryan, Whittaker, Andrew K. and Zimmerman, Paul (2007). Synthesis of Novel Polymer Resists for 193nm Immersion Lithography. In: Proceedings of the 29th Australasian Polymer Symposium. 29th Australasian Polymer Symposium, Hobart, (148-149). 11-15 February, 2007. 81  
Jack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin and Whittaker, Andrew (2007). The rational design of polymeric EUV resist materials by QSPR modelling. In: Proceedings of SPIE. Advances in Resist Materials and Processing Technology XXIV, San Jose, CA, USA, (Z5193-Z5193). 26 February, 2007. doi:10.1117/12.716213 81   9 Cited 15 times in Scopus15 0
Blakey, I., George, G. A., Hill, D. J. T., Liu, H. P., Rasoul, F., Whittaker, A. K. and Zimmerman, P. (2005) XPS and F-19 NMR study of the photodegradation at 157 nm of photolithographic-grade teflon AF thin films. Macromolecules, 38 10: 4050-4053. doi:10.1021/ma047436+ 75   9 Cited 7 times in Scopus7 0