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Chen, Lan, Goh, Yong Keng, Cheng, Han Hao, Smith, Bruce W., Xie, Peng, Montgomery, Warren, Whittaker, Andrew K. and Blakey, Idriss (2012) Aqueous developable dual switching photoresists for nanolithography. Journal of Polymer Science Part A: Polymer Chemistry, 50 20: 4255-4265. doi:10.1002/pola.26232 71   6 Cited 6 times in Scopus6 0
Chen, Lan, Goh, Yong Keng, Lawrie, Kirsten Jean, Smith, Bruce, Montgomery, Warren, Zimmerman, Paul, Blakey, Idriss and Whittaker, Andrew K. (2010). Non-chemically amplified resists for 193-nm immersion lithography: Influence of absorbance on performance. In: Robert D. Allen and Mark H. Somervell, Proceedings of SPIE - The International Society for Optical Engineering. Advances in Resist Materials and Processing Technology XXVII, San Jose, California, U.S.A., (). 22-24 February, 2010. doi:10.1117/12.846971 71   1 Cited 4 times in Scopus4 0
Goh, Yong Keng, Chen, Lan, Dorgelo, Anneke, Peng, Xie, Lafferty, Neal, Smith, Bruce, Zimmerman, Paul, Montgomery, Warren, Blakey, Idriss and Whittaker, Andrew K. (2011). Sensitive polysulfone based chain scissioning resists for 193 nm lithography. In: Advances in resist materials and processing technology XXVIII. Advances in Resist Materials and Processing Technology XXVIII, San Jose, California, United States, (79722E.1-79722E.8). 28 February - 2 March 2011. doi:10.1117/12.881700 63   0 Cited 0 times in Scopus0 0