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Keen, Imelda, Cheng, Han-Hao, Yu, Anguang, Jack, Kevin S., Younkin, Todd R., Leeson, Michael J., Whittaker, Andrew K. and Blakey, Idriss (2014) Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures. Macromolecules, 47 1: 276-283. doi:10.1021/ma4019735 67   2 Cited 4 times in Scopus4 2
Cheng, Han-Hao, Yu, Anguang, Keen, Imelda, Chuang, Yami, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R., Blakey, Idriss and Whittaker, Andrew K. (2012) Electron-beam induced freezing of an aromatic based EUV resist: a robust template for directed self assembly of block copolymers. IEEE Transactions on Nanotechnology, 11 6: 1140-1147. doi:10.1109/TNANO.2012.2216544 78   3 Cited 6 times in Scopus6 0
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Electron-beam-induced freezing of a positive tone EUV resist for use in directed self-assembly applications. In: Proceedings of SPIE - International Society for Optical Engineering. Alternative Lithographic Technologies III, San Jose, CA, United States, (79701V.1-79701V.9). 1-3 March 2011. doi:10.1117/12.881491 92 3 2 Cited 3 times in Scopus3 1
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2012). EUVL compatible, LER solutions using functional block copolymers. In: William M. Tong and Douglas J. Resnick, Proceedings of SPIE: Alternative Lithographic Technologies IV. Conference on Alternative Lithographic Technologies IV, San Jose, CA, United States, (83231O.1-83231O.11). 13-16 February 2012. doi:10.1117/12.916744 84   0 Cited 6 times in Scopus6 0
Lawrie, Kirsten, Blakey, Idriss, Blinco, James, Gronheid, Roel, Jack, Kevin, Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists. In: O. Guven, D.J.T. Hill and S. Tagawa, Radiation Modification Of Polymers. 11th Pacific Polymer Conference, Cairns, Australia, (236-241). 6-10 December 2009. doi:10.1016/j.radphyschem.2010.07.038 144   9 Cited 9 times in Scopus9 0