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Liu, Heping, Blakey, Idriss, Conley, Willard E., Graeme George, Hill, David J. T. and Whittaker, Andrew K. (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7 2: 023001-1-023001-11. doi:10.1117/1.2908937 102   6 0