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Chen, Lan, Goh, Yong Keng, Cheng, Han Hao, Smith, Bruce W., Xie, Peng, Montgomery, Warren, Whittaker, Andrew K. and Blakey, Idriss (2012) Aqueous developable dual switching photoresists for nanolithography. Journal of Polymer Science Part A: Polymer Chemistry, 50 20: 4255-4265. doi:10.1002/pola.26232 76   8 Cited 8 times in Scopus8 0
Keen, Imelda, Cheng, Han-Hao, Yu, Anguang, Jack, Kevin S., Younkin, Todd R., Leeson, Michael J., Whittaker, Andrew K. and Blakey, Idriss (2014) Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures. Macromolecules, 47 1: 276-283. doi:10.1021/ma4019735 67   2 Cited 4 times in Scopus4 2
Bennett, Thomas M., Pei, Kevin, Cheng, Han-Hao, Thurecht, Kristofer J., Jack, Kevin S. and Blakey, Idriss (2014) Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?. Journal of Micro/Nanolithography, MEMS and MOEMS, 13 3: 031304.1-031304.9. doi:10.1117/1.JMM.13.3.031304 23   1 Cited 1 times in Scopus1 0
Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leesion, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011) Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers. Journal of Materials Chemistry, 21 15: 5629-5637. doi:10.1039/c0jm03288c 87   9 Cited 13 times in Scopus13 0
Keen, Imelda, Yu, Anguang, Cheng, Han-Hao, Jack, Kevin S., Nicholson, Timothy, Whittaker, Andrew K. and Blakey, Idriss (2012) Control of the orientation of symmetric poly(styrene)-block-poly(D,L-lactide) block copolymers using statistical copolymers of dissimilar composition. Langmuir, 28 45: 15876-15888. doi:10.1021/la304141m 110   19 Cited 18 times in Scopus18 0
Cheng, Han-Hao, Yu, Anguang, Keen, Imelda, Chuang, Yami, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R., Blakey, Idriss and Whittaker, Andrew K. (2012) Electron-beam induced freezing of an aromatic based EUV resist: a robust template for directed self assembly of block copolymers. IEEE Transactions on Nanotechnology, 11 6: 1140-1147. doi:10.1109/TNANO.2012.2216544 78   3 Cited 6 times in Scopus6 0
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011). Electron-beam-induced freezing of a positive tone EUV resist for use in directed self-assembly applications. In: Proceedings of SPIE - International Society for Optical Engineering. Alternative Lithographic Technologies III, San Jose, CA, United States, (79701V.1-79701V.9). 1-3 March 2011. doi:10.1117/12.881491 92 3 2 Cited 3 times in Scopus3 1
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2012). EUVL compatible, LER solutions using functional block copolymers. In: William M. Tong and Douglas J. Resnick, Proceedings of SPIE: Alternative Lithographic Technologies IV. Conference on Alternative Lithographic Technologies IV, San Jose, CA, United States, (83231O.1-83231O.11). 13-16 February 2012. doi:10.1117/12.916744 84   0 Cited 6 times in Scopus6 0
Bennett, Thomas, Pei, Kevin, Cheng, Han-Hao, Thurecht, Kristofe J., Jack, Kevin S. and Blakey, Idriss (2014). Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self assembly. In: Douglas J. Resnick and Christopher Bencher, Proceedings of SPIE: Alternative Lithographic Technologies VI. Alternative Lithographic Technologies VI, San Jose, United States, (). 24-27 February 2014. doi:10.1117/12.2046296 68 3 0 Cited 0 times in Scopus0 0
Chuang, Ya-Mi, Cheng, Han-Hao, Jack, Kevin, Whittaker, Andrew and Blakey, Idriss (2013). Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers. In: William M. Tong and Douglas J. Resnick, Alternative lithographic technologies V. Conference on Alternative Lithographic Technologies V, San Jose, CA United States, (868009.1-868009.9). 25-28 February 2013. doi:10.1117/12.2012488 39 2 1 Cited 3 times in Scopus3 0
Cheng, Han-Hao (2008). The fabrication and characterisation of 1D metallic nanotransistors. In: Current Applied Physics. Proceedings of the Third International Conference on Advanced Materials and Nanotechnology (AMN-3). AMN3 2007: Advanced Materials and Nanotechnology, Wellingon, New Zealand, (). 11-16 February 2007. 43  
Cheng, Han-Hao, Alkaisi, M. M. and Siaw, J. K. (2006). The fabrication of metallic nanotransistors. In: Current Applied Physics. Proceedings of the Second International Conference on Advanced Materials and Nanotechnology (AMN-2). AMN-2: Second International Conference on Advanced Materials and Nanotechnology, Queenstown, New Zealand, (). 6-11 February 2005. 41  
Chuang, Ya-Mi, Jack, Kevin S., Cheng, Han-Hao, Whittaker, Andrew K. and Blakey, Idriss (2012) Using directed self assembly of block copolymer nanostructures to modulate nanoscale surface roughness: towards a novel lithographic process. Advanced Functional Materials, 23 2: 173-183. doi:10.1002/adfm.201200564 65   10 Cited 11 times in Scopus11 0